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Blowing of polycrystalline silicon fuses

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Show simple item record Lee, William T. Fowler, Andrew C. Power, O. Healy, S. Browne, J. 2016-04-26T09:14:27Z 2016-04-26T09:14:27Z 2010
dc.description peer-reviewed en_US
dc.description.abstract Polycrystalline silicon fuses are one time programmable memory elements which allow the calibration of integrated circuits at wafer and package level. We present a zero-dimensional lumped parameter model of the programming of fuses made from a combination of tungsten silicide and polycrystalline silicon. The components of the model are an electrical model, a thermal model, and a flow model. The model generates quantitatively accurate results and reproduces trends with applied voltage and fuse size. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3457469] en_US
dc.language.iso eng en_US
dc.publisher American Institute of Physics en_US
dc.relation.ispartofseries Applied Physics;97, 023502
dc.rights Copyright 2010 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article "Blowing of polycrystalline silicon fuses" appeared in Applied Physics Letters, 97, 023502 and may be found at en_US
dc.subject charge injection en_US
dc.subject diffraction en_US
dc.subject electrodes en_US
dc.subject gold en_US
dc.subject organic semiconductors en_US
dc.subject point contacts en_US
dc.subject thin film transistors en_US
dc.title Blowing of polycrystalline silicon fuses en_US
dc.type info:eu-repo/semantics/article en_US
dc.type.supercollection all_ul_research en_US
dc.type.supercollection ul_published_reviewed en_US 2016-04-26T09:03:34Z
dc.description.version PUBLISHED
dc.contributor.sponsor SFI en_US
dc.relation.projectid 06/MI/005 en_US
dc.rights.accessrights info:eu-repo/semantics/openAccess en_US
dc.internal.rssid 1132556
dc.internal.copyrightchecked Yes
dc.description.status peer-reviewed

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