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The approach to the development of an assessment method for IEC 80001-1

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Show simple item record MacMahon, Silvana Togneri Mc Caffery, Fergal Keenan, Frank 2014-06-05T14:43:57Z 2014-06-05T14:43:57Z 2013
dc.description peer-reviewed en_US
dc.description.abstract IEC 80001-1 is a risk management standard that addresses the risks associated with the incorporation of a medical device into an IT network. Our research in the area of IEC 80001-1 has to date been focused on the development of a Process Reference Model (PRM) and Process Assessment Model (PAM) for assessment against IEC 80001-1. In this paper we present the approach to the next phase of our research which focuses on the development of an assessment method which will be used to perform an assessment using the IEC 80001-1 PAM. The assessment method will ensure a standardized approach to performing an assessment while identifying key success and will contain a list of questions which will allow assessors to determine the capability level of processes within the PAM. The results of the assessment can be used as a basis for process improvement. en_US
dc.language.iso eng en_US
dc.publisher Springer en_US
dc.relation.ispartofseries The 13th International SPICE Conference on Process Improvement and Capability dEtermination [Communications in Computer and Information Science];349, pp. 37-48
dc.rights The original publication is available at en_US
dc.subject IEC 80001-1 en_US
dc.subject ISO/IEC 15504 – process assessment en_US
dc.subject risk management en_US
dc.subject medical IT networks en_US
dc.subject assessment method en_US
dc.title The approach to the development of an assessment method for IEC 80001-1 en_US
dc.type info:eu-repo/semantics/conferenceObject en_US
dc.type.supercollection all_ul_research en_US
dc.type.supercollection ul_published_reviewed en_US
dc.contributor.sponsor SFI en_US
dc.relation.projectid 07/SK/I1299 en_US
dc.relation.projectid 08/IN.1/I2030 en_US
dc.relation.projectid 10/CE/I1855 en_US
dc.rights.accessrights info:eu-repo/semantics/openAccess en_US

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