Arshak, Khalil; Mihov, Miroslav; Arshak, Arousian; McDonagh, Declan; Sutton, D
(IEEE Computer Society, 2004)
Focused Ion Beam (FIB) lithography has
significant advantages over the electron beam counterpart in terms
of resist sensitivity, backscattering and proximity effects.
Applying the Top Surface Imaging (TSI) principal to ...