dc.contributor.author | Arshak, Khalil | |
dc.contributor.author | Arshak, Arousian | |
dc.contributor.author | Mihov, Miroslav | |
dc.contributor.author | McDonagh, Declan | |
dc.date.accessioned | 2011-07-01T15:36:54Z | |
dc.date.available | 2011-07-01T15:36:54Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | http://hdl.handle.net/10344/1049 | |
dc.description | peer-reviewed | |
dc.description.abstract | In this paper, liquid-phase silylation process for Top Surface Imaging Lithography systems incorporated e-beam exposure has been experimentally investigated using FT-IR spectroscopy, UV spectroscopy, SIM spectrometry and SEM cross-sectionals. The impact of different silylating agents on Shipley SPR505A resist system is presented for both the UV exposed and e-beam crosslinked regions of the resist. Results show that an e-beam dose of 50μC/cm2 at 30KeV is sufficient to crosslink the resist and prevent silylation. The silylation contrast using HMCTS was found to be the highest (11:1) in comparison with other two agents. It was found that the silicon incorporation in SPR505A resist follows Case II diffusion mechanisms. | en_US |
dc.language.iso | eng | en_US |
dc.publisher | IEEE Computer Society | en_US |
dc.relation.ispartofseries | Proceedings 23rd International Conference on Microelectronics (MIEL 2002), | |
dc.relation.uri | http://dx.doi.org/10.1109/MIEL.2002.1003307 | |
dc.rights | ©2008 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works. | en_US |
dc.subject | liquid-phase silylation | en_US |
dc.title | Top surface imaging lithography processes for I-line resists using liquid-phase silylation | en_US |
dc.type | Conference item | en_US |
dc.type.supercollection | all_ul_research | en_US |
dc.type.supercollection | ul_published_reviewed | en_US |
dc.type.restriction | none | en |