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γ-Radiation dosimetry using screen printed nickel oxide thick films

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Show simple item record Arshak, Khalil Korostynska, Olga Harris, John A. 2011-07-01T15:36:33Z 2011-07-01T15:36:33Z 2002
dc.description peer-reviewed
dc.description.abstract Thick films of Nickel oxide (NiO) were investigated for γ-radiation dosimetry purposes. Samples were fabricated using the thick film screen printing technique. Absorption spectra for NiO films were recorded and the values of the optical band gap for as-printed, irradiated and annealed films were calculated. It was found that the optical band gap value decreased as the radiation dose was increased. Samples with an Ag-NiO-Ag sandwich structure were exposed to a 60Co γ-radiation source at a dose rate of 6 Gy/min. The relative change in current increased linearly with increased dosage up to 720 Gy. The I-V characteristics indicated a Poole-Frenkel conduction mechanism. It was found that annealing restored both the electrical and the optical properties of the samples. en_US
dc.description.sponsorship EI
dc.language.iso eng en_US
dc.publisher IEEE Computer Society en_US
dc.relation.ispartofseries MIEL 2002, 23rd International Conference on Microelectronics, 2002;
dc.rights ©2002 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works. en_US
dc.subject thick films en_US
dc.subject gamma radiation en_US
dc.title γ-Radiation dosimetry using screen printed nickel oxide thick films en_US
dc.type Conference item en_US
dc.type.supercollection all_ul_research en_US
dc.type.supercollection ul_published_reviewed en_US
dc.type.restriction none en

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