Arshak, Khalil; Mihov, Miroslav; Arshak, Arousian; McDonagh, Declan; Pomeroy, Michael J.
(IEEE Computer Society, 2001)
The positive resist image by dry etching (PRIME)
process is a high resolution lithography system
incorporating electron beam exposure, silylation and
dry development. The process steps in PRIME with
Shipley SPRSOSA ...