Arshak, Khalil; Gilmartin, Stephen L.; Arshak, Arousian; Collins, Damien; Korostynska, Olga
(IEEE Computer Society, 2005)
The 2-step negative resist image by dry etching
(2-step NERIME) focused ion beam (FIB) top surface imaging (TSI) process has been previously reported
as an excellent technique for patterning nanometer
scale features ...