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Patterning nanometer resist features on planar & topography substrates using the 2-step NERIME FIB top surface imaging process

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dc.contributor.author Arshak, Khalil
dc.contributor.author Gilmartin, Stephen L.
dc.contributor.author Arshak, Arousian
dc.contributor.author Collins, Damien
dc.contributor.author Korostynska, Olga
dc.date.accessioned 2011-07-20T12:40:10Z
dc.date.available 2011-07-20T12:40:10Z
dc.date.issued 2005
dc.identifier.uri http://hdl.handle.net/10344/1130
dc.description peer-reviewed
dc.description.abstract The 2-step negative resist image by dry etching (2-step NERIME) focused ion beam (FIB) top surface imaging (TSI) process has been previously reported as an excellent technique for patterning nanometer scale features in DNQ/novolak based photoresists on silicon substrates. In this paper we demonstrate that the 2-step NERIME process can be used to pattern nanometer scale resist features on different substrate materials and topography substrates. en_US
dc.language.iso eng en_US
dc.publisher IEEE Computer Society en_US
dc.relation.ispartofseries ICMENS’05 Proceedings of the 2005 International Conference on MEMS, NANO and Smart Systems
dc.rights ©2005 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works. en_US
dc.subject focused ion beam
dc.subject top surface imaging
dc.title Patterning nanometer resist features on planar & topography substrates using the 2-step NERIME FIB top surface imaging process en_US
dc.type Conference item en_US
dc.type.supercollection all_ul_research en_US
dc.type.supercollection ul_published_reviewed en_US
dc.type.restriction none en

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