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Browsing by Author "Mihov, Miroslav"

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Browsing by Author "Mihov, Miroslav"

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  • Arshak, Khalil; Mihov, Miroslav; Arshak, Arousian; McDonagh, Declan; Sutton, D (IEEE Computer Society, 2004)
    Focused Ion Beam (FIB) lithography has significant advantages over the electron beam counterpart in terms of resist sensitivity, backscattering and proximity effects. Applying the Top Surface Imaging (TSI) principal to ...
  • Arshak, Khalil; Mihov, Miroslav; Arshak, Arousian; McDonagh, Declan; Pomeroy, Michael J. (IEEE Computer Society, 2001)
    The positive resist image by dry etching (PRIME) process is a high resolution lithography system incorporating electron beam exposure, silylation and dry development. The process steps in PRIME with Shipley SPRSOSA ...
  • Arshak, Khalil; Arshak, Arousian; Mihov, Miroslav; McDonagh, Declan (IEEE Computer Society, 2002)
    In this paper, liquid-phase silylation process for Top Surface Imaging Lithography systems incorporated e-beam exposure has been experimentally investigated using FT-IR spectroscopy, UV spectroscopy, SIM spectrometry ...

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